April 2 - 6, 2018
Phoenix, Arizona
2018 MRS Spring Meeting
EP04.10.02
Characterization of Plasma Induced Damage, Strain and Sidewall Roughness on InP Patterns and Their Impact on Luminescence
When and Where
Apr 5, 2018
2:00pm - 2:15pm
2:00pm - 2:15pm
PCC North, 200 Level, Room 221 B
Presenter(s)
Co-Author(s)
Névine Rochat2,Marc Fouchier1,Maria Fahed1,Erwine Pargon1,Jean-Pierre Landesman3,Joyce Roque2,Denis Rouchon2,Patrice Gergaud2,Sylvain David1,Karine Rovayaz1,Eugénie Martinez2,Jean-Charles Barbé2,Sébastien Labau1
Univ. Grenoble Alpes, CNRS, LTM1,Univ. Grenoble Alpes, CEA, LETI2,Institut de Physique de Rennes, CNRS-UMR 6251, Université Rennes-13
Keywords
luminescence | reactive ion etching
Symposium Organizers
Osamu Ueda, Kanazawa Institute of Technology
Robert Herrick, Intel Corporation
Matteo Meneghini, University of Padova
Kenji Shiojima, University of Fukui
Symposium Support
MRS Invitation to Publish
All authors are invited to submit articles based on their 2018 MRS Spring
Meeting presentations to journals in the MRS portfolio.
(www.mrs.org/publications-news) Papers submitted and accepted for
publication in MRS Advances (www.mrs.org/mrs-advances) will be
available as symposium collections. Visit the MRS/Cambridge University
Press Publications Booth #100 in the Exhibit Hall to learn more, including
MRS Advances print options available at special rates during the meeting
week only.
All authors are invited to submit articles based on their 2018 MRS Spring
Meeting presentations to journals in the MRS portfolio.
(www.mrs.org/publications-news) Papers submitted and accepted for
publication in MRS Advances (www.mrs.org/mrs-advances) will be
available as symposium collections. Visit the MRS/Cambridge University
Press Publications Booth #100 in the Exhibit Hall to learn more, including
MRS Advances print options available at special rates during the meeting
week only.
Session Chairs
S. Fujita
Kenji Shiojima