Surfaces and interfaces have become increasingly important factors for the integration of emerging materials and the implementation of latest fabrication processes into new generation of electronic and photonic devices. When interfaces are formed at the junction between materials surfaces with dissimilar properties, surprising new properties not present in either parent phase emerge at the intersection. These intriguing interfacial properties play key roles in organizing the multilayered device structures and modulating the charge-transfer dynamics across connecting layers. As system dimensions are scaled downward for future electronic device applications and heterogeneous integration of inorganic and organic surfaces are getting prevalent in wearable devices, the nature and complexity of materials interfaces bring tremendous challenges to scientists and engineers resulting in slowing down the progress towards emerging applications. Advanced characterization techniques to study these complex interfaces accurately are also rare. Methods of film and surface preparation and interface formation are often coupled, and they significantly affect the operation of devices. Thus, this symposium is aimed at bringing together experts in the different aspects of materials surfaces and interfaces ranging from advanced characterization, to unconventional film-growth, patterning and device level integration. Both experimental and theoretical papers are welcome. Special emphasis will be given to papers in areas of in situ characterization techniques as well as modelling and multiscale simulations.

adsorption atomic layer deposition chemical vapor deposition (CVD) (deposition) ink-jet printing physical vapor deposition (PVD) self-assembly surface chemistry