Plasmas are unique tools for materials science in terms of both versatility and complexity. Plasma-enhanced processes have been crucial for the growth of the semiconductor industry. Today, plasmas continue to be at the cutting edge of materials research. Their use for atomic layer deposition and etching, for the processing of 2D materials, and for the synthesis of materials for quantum computing underscores their critical role in the microelectronics industry. Their inherent state of thermodynamic non-equilibrium sets them apart from any other materials processing technique, enabling access to materials that would be otherwise unachievable. These novel materials offer immense potential in applications such as photonics, energy storage, and biotechnology, among others. Exciting new opportunities are being explored with respect of driving surface chemistry on plasma-exposed catalysts and initiating electrochemical reactions in liquids.

This symposium will bring together the diverse group of researchers, from both academia and industry, that dedicate their efforts to plasma science and technology at the forefront of materials research. It will provide them with an opportunity to showcase their most recent contributions related to plasma-material interfaces. The complexity of these interfaces creates a vast opportunity for discovery, and the growing prevalence of plasma science in materials fields confirms the importance of this area. This symposium will include topics that relate to diagnostics of the plasma-materials interface, ab-initio atomistic modelling of materials under plasma exposure, use of machine learning to investigate interfacial phenomena, and finally the leveraging of the interface to achieve materials with new functionalities.

atomic layer deposition atomic layer etching in situ nucleation & growth operando reactive ion etching