December 1 - 6, 2024
Boston, Massachusetts

Event Supporters

2024 MRS Fall Meeting & Exhibit

Symposium NM04-Exploring the Properties and Applications of Freestanding Membranes—From 2D to 3D

The goal of the symposium is to allow the community to come together to advance the freestanding nano-membrane-related research from 2D materials to ultra-thin 3D materials with electronic, photonic, and electrochemical applications. The technological innovation in microelectronic devices has been led by silicon owing to its mature processing, but the increasing demand for ultra low-power electronics and miniaturization urges to develop new types of materials and architectures that have superior performances and properties as well as design flexibility for integration. Recently, emerging freestanding nano-membranes including 2D materials and ultrathin 3D materials have been developed, merging epitaxial complex oxides with the successful methodology from low-dimensional (Van der Waals (VdW) heterostructures) systems as a new material building block to create new functional devices and discover new physical phenomena. The freestanding membranes can substantially bring a new paradigm in the electrical, magnetic, optical, and thermal properties, leading to abundant intriguing functionalities. Thus, a great deal of effort has been made to innovate device architectures. To obtain high-quality freestanding nano-membranes, significant progress has been made in in situ growth or ex situ transfer techniques. These are critical approaches to obtaining extensive and flexible designs of novel structures. In this symposium, we provide the opportunity for speakers and audience to share their latest progress in the research of novel freestanding thin films, including the methods for synthesis, fabrication, layer lift-off, transfer, and stack as well as their scaling-up for device applications. The symposium will cover a complete range of topics related to various freestanding thin films from fundamentals to applications. Interdisciplinary topics related to physics, materials science, and engineering will be connected by invited talks to accelerate the development of various freestanding nano-membranes and their applications. The session will also be dedicated to motivating discussions toward emerging technology to develop new types of integrated structures using 2D materials, and ultra-thin 3D materials.

Topics will include:

  • Remote epitaxy and van der Waals epitaxy of semiconductors, complex oxides, and 2D materials
  • Synthesis science with remote epitaxy for novel structures and physical phenomena
  • Novel sacrificial layer of complex oxides and semiconductors
  • Stacking and twisting of complex oxides and semiconductors
  • Layer lift-off technology (mechanical, optical, chemical, and so on)
  • Synthesis of various 2D materials and 3D thin films as well as their heterostructures
  • The role of interfaces in determining the properties
  • Heterogeneous integration of freestanding material films and their applications
  • Optical, electrical, and magnetic interaction at the hetero-interface
  • Strain engineering in freestanding materials

Invited Speakers:

  • Jong-Hyun Ahn (Yonsei University, Republic of Korea)
  • Andrea Caviglia (Delft University of Technology, Netherlands)
  • Woo Seok Choi (Sungkyunkwan University, Republic of Korea)
  • Chang-Beom Eom (University of Wisconsin–Madison, USA)
  • Stephen Forrest (University of Michigan, USA)
  • Rachel S. Goldman (University of Michigan, USA)
  • Felix Gunkel (Forschungszentrum Jülich GmbH, Germany)
  • Yimo Han (Rice University, USA)
  • Mark Hersam (Northwestern University, USA)
  • Harold Hwang (Stanford University, USA)
  • Thomas Sand Jespersen (Technical University of Denmark, Denmark)
  • Hyun S Kum (Yonsei University, Republic of Korea)
  • Chun Ning Lau (The Ohio State University, USA)
  • Kyusang Lee (University of Virginia, USA)
  • Xiuling Li (The University of Texas at Austin, USA)
  • Yu Jung Lu (Academia Sinica, Taiwan)
  • Judith L. MacManus-Driscoll (University of Cambridge, United Kingdom)
  • Feng Miao (Nanjing University, China)
  • Abdallah Ougazzaden (Georgia Tech Lorraine, France)
  • Aaron Ptak (National Renewable Energy Laboratory, USA)
  • Paolo G. Radaelli (University of Oxford, United Kingdom)
  • Joan Redwing (The Pennsylvania State University, USA)
  • Kate Reidy (Massachusetts Institute of Technology, USA)
  • Frances Ross (Massachusetts Institute of Technology, USA)
  • Jutta Schwarzkopf (Leibniz-Institut für Kristallzüchtung, Germany)
  • Jian Shi (Rensselaer Polytechnic Institute, USA)
  • Michel Snure (Air Force Research Laboratory, USA)
  • Stephanie Tomasulo (U.S. Naval Research Laboratory, USA)
  • Vincent Tung (The University of Tokyo, Japan)
  • Mona Zebarjadi (University of Virginia, USA)

Symposium Organizers

Jeehwan Kim
Massachusetts Institute of Technology
Department of Mechanical Engineering
USA

Sang-Hoon Bae
Washington University in St. Louis
USA

Ho Nyung Lee
Oak Ridge National Laboratory
USA

Nini Pryds
Technical University of Denmark
Denmark

Topics

chemical vapor deposition (CVD) (deposition) crystal growth elastic properties electrical properties epitaxy magnetic properties molecular beam epitaxy (MBE) nucleation & growth strain relationship thermal conductivity