Symposium SF04-Expanding the Frontiers of Plasma Technology in Materials Science and Engineering

Plasma technology has achieved great advances for a vast range of applications in materials science and engineering, from industrial settings to cutting-edge laboratory investigations. Because of the unique energy coupling, plasmas enable reactions and interactions in the gas phase and near interfaces that are otherwise impossible to achieve with conventional methods (e.g., thermal). Plasma-based techniques offer a wide range of experimental conditions, varying from low- to high-pressure and including diverging degrees of equilibrium (from thermal equilibrium to non-equilibrium). These features are key to develop next-generation material processes, which include many plasma-enhanced techniques (e.g., plasma-assisted 3D printing, atomic layer deposition and etching) as well as rapidly emerging approaches (e.g., flow-through nucleation, hybrid plasma-liquid processes, plasma catalysis). This symposium aims to bring together experts in different areas of plasma-based synthesis, processing and applications. Specifically, the symposium will highlight how plasmas can greatly contribute to the development and synthesis of functional nanomaterials and quantum materials, innovative 3D printing, next-generation electronics and communication technologies, biosensors and biomaterials, lightweight and high-strength composites. It will cover recent advances and emerging opportunities in the synthesis of materials with unique and tailored properties for energy and catalysis applications, materials for extreme conditions, structural composites, flexible/textile and other non-conventional surfaces. Further, the complexity of plasmas lends itself to data-driven materials research. Therefore, the symposium will also include topics that relate to artificial intelligence, machine learning and in situ and operando characterization, allowing the optimization of materials synthesis and processing, while opening new avenues to control plasma-material interactions down to the atomic scale.

Topics will include:

Plasma surface and interface engineering
Plasma synthesis and processing of nanomaterials and quantum materials
Plasmas for (multi-)functional and smart materials
Plasma processes for biosensors and biomaterials
Plasmas for 3D printing, bioprinting and additive manufacturing
Plasmas for e-textiles, flexible electronics and other non-conventional surfaces
Plasmas for lightweight and high-strength composites
Plasma synthesis and processing of materials for energy harvesting and storage
Plasma catalysis and plasma synthesis of materials for catalysis
Plasma synthesis and processing of materials for extreme conditions
Machine Learning, artificial intelligence etc. for plasma processes
Diagnostics and fundamental plasma science for materials processes

Invited Speakers:

Sumit Agarwal (Colorado School of Mines, USA)
Eray Aidyl (New York University, USA)
Behnam Akhavan (University of Newcastle, Australia)
Jan Benedikt (Kiel University, Germany)
Jane Chang (University of California, Los Angeles, USA)
Wei-Hung Chiang (National Taiwan University of Science and Technology, Taiwan)
Anna Maria Coclite (Graz University of Technology, Austria)
Mariadriana Creatore (Eindhoven University of Technology, Netherlands)
Davide Mariotti (Ulster University, United Kingdom)
Matthias Muehle (Fraunhofer USA, USA)
Kentaro Shinoda (National Institute of Advanced Industrial Science and Technology, Japan)
Luc Stafford (University of Montreal, Canada)
Lea Winter (Yale University, USA)
Chi-Chin Wu (U.S. Army Research Laboratory, USA)
Hideaki Yamada (National Institute of Advanced Industrial Science and Technology, Japan)
Shurik Yatom (Princeton Plasma Physics Laboratory, USA)
Lenka Zajíčková (Masaryk University, Czech Republic)