Focused ion-beam (FIB) based tools have become invaluable in materials science and engineering for their capabilities in micro-/nanofabrication, imaging and spectroscopy. Source types include Liquid Metal Ion Sources (LMIS), Gas Field Ionization Sources (GFIS), plasma ion sources and laser-cooled sources, offering an ever increasing choice of focused ion species for a wide range of applications. Modification of materials by direct-write nanofabrication using milling, deposition and implantation is employed extensively in both industry and academia. Novel in-situ combinatorial techniques present new routes for exploring and quantifying materials at the nanoscale, for example through coupling to Secondary Ion Mass Spectrometry (SIMS); and through correlative imaging using ion, electron, light and x-ray based techniques, culminating in truly interdisciplinary work. This symposium aims to provide a forum for exchange on a variety of emerging technologies and applications in this area.

A broad range of topics will be addressed, with particular focus on recent technological advancements, concepts for novel ion sources, frontiers in nanofabrication, direct-write atomic and chemical disordering, in-situ platforms (e.g. heating, environmental cells), in-situ multimodal analysis, slice-and-image tomography and correlative microscopy, advances in computational techniques for data analysis, and novel simulation codes. Reflecting the interdisciplinary nature of this field, results pertaining to a wide variety of materials, including 2D materials, semiconductors, superconductors, ferroelectric and magnetic materials, polymers, and biological samples will be presented and discussed.

defects ion beam analysis ion-beam assisted deposition ion-beam processing ion-implantation ion-solid interactions lithography (removal) nanostructure secondary ion mass spectroscopy (SIMS)