Plasma-based synthesis and processing is an important technique for fabricating and functionalizing novel and technologically-useful materials at different length scales. Plasmas enable reactions and interactions that are otherwise impossible to achieve with conventional methods (e.g. thermal) because of unique energy coupling. However, with the diverse chemistries and materials accessible by plasma-based processes comes complexity regardless in the gas or liquid phases. There are many different plasma sources, ranging from those operated at low pressures (vacuum) to high pressures (atmospheric), degrees of equilibrium, from non-thermal and non-equilibrium to thermal equilibrium, and many types of plasma-material interactions, from physical sputtering to reactive etching to nucleation. Despite such vast differences from one plasma-based process to another and the complexity of sciences that are encompassed, there are basic fundamentals underlying the plasma physics and chemistry and the synthesis of materials. This symposium intends to serve as a special forum to bring together experts working in different fields that encompass and overlap in the area of plasma synthesis and processing of materials using varying plasma techniques. Specifically, the symposium will cover topics related to new frontiers in materials design such as nanoscale materials and their applications, and attempt to identify and address current challenges, as well as advanced understanding on plasma phenomena via different plasma simulation modeling techniques.

energy storage plasma deposition plasma-enhanced CVD (PECVD) (deposition) reactivity sputtering surface chemistry