2017 MRS Spring Meeting
Symposium ED7-Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
The scaling of silicon MOSFETs, DRAM, and Flash memory has already required the use for finFETS, high-k dielectrics and SiGe stressors and there is active research in tunnelFETs. Further progress requires new materials and new device design engineering. For future MOSFET logic devices and power MOSFETs, novel channel materials such as broken-gap semiconductor heterostructures, transition metal dichalcogenides (TMD), and related materials are being investigated along with novel gates such as ferroelectrics and spin-based materials. Future non-volatile memory includes phase change memory with multistate gates, ferroelectrics, and 3D structures. This symposium will emphasize not only the advances in materials but also the new device structures that are required for the new materials to provide substantial improvements in device performance.
Topics will include:
- High conductivity sources and drains for future MOSFETS
- Electrical reliability of nanoscale devices and its modeling
- Materials and mechanisms of Resistive RAM
- Fabrication techniques for three dimensional devices
- Negative capacitance and ferroelectric materials and devices
- Unconventional transistors, switch/memory designs including tunnel FETs, TMD heterostructure FETs, spinFETS, 3D transistors
- High-k dielectrics, oxide stacks, and metal gates for SiGe, Ge, III-V, GaN, TMD, graphene, DRAM and flash memory
- Engineering of band offsets, dielectric behavior, and work function control
- Gate-stack materials and interfaces for future switches and memory
- Integration techniques for low dimensional materials into 3D devices
- Surface pretreatments and cleaning of non-Si channel materials
Invited Speakers:
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_0 (University of California, Santa Barbara, USA)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_1 (TEL, USA)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_2 (IBM, Switzerland)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_3 (University of Notre Dame, USA)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_4 (University of California, Berkeley, USA)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_5 (Global Foundaries, USA)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power_6 (National Taiwan Normal University, Taiwan)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_7 (National Taiwan University, Taiwan)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_8 (National Institute of Advanced Industrial Science and Technology, Japan)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_9 (Samsung, Republic of Korea)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_10 (Intel, USA)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_11 (The Pennsylvania State University, USA)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_12 (Dresden University of Technology, Germany)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_13 (Australia National University, USA)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_14 (Tokyo University, Japan)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_15 (University of Texas at Dallas, USA)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_16 (Aachen University, Germany)
- ED7_Materials and Device Engineering for Beyond the Roadmap Devices in Logic, Memory and Power
_17 (Cornell University, USA)
Symposium Organizers
Andrew Kummel
University of California, San Diego
Chemistry and Biochemistry
USA
Alexander Demkov
University of Texas at Austin
Department of Physics
USA
John Robertson
University of Cambridge
Engineering
United Kingdom
Shinichi Takagi
The University of Tokyo
Department of Electrical Engineering and Information Systems, School of Engineering
Japan
Topics
electronic material
ferroelectric
graphene
III-V
Magnetic
memory
microelectronics
nitride
oxide
semiconducting