This symposium will cover a wide range of topics in the science and technology of silicon-based materials and devices emerging beyond conventional wafer-based photovoltaics and microelectronics. Silicon-based materials include—but are not limited to—amorphous, nanocrystalline, microcrystalline, polycrystalline and monocrystalline films produced by chemical vapor deposition (CVD), layer separation/transfer, solution synthesis, and micro- or nanofabrication. Examples include: amorphous and nano/micro-crystalline silicon films grown by plasma-enhanced CVD, ultrathin silicon substrates produced by spalling or porous silicon processes, and laser-crystallized silicon films.
The symposium will also examine silicon and silicon-nanostructured alloys as well as films and structures of any material that enable unique functions within silicon-based devices. Examples include: heterojunctions, carrier-selective contacts, passivation layers, back reflectors, transparent conductive oxides, light-trapping structures for solar cells, dielectric layers in thin-film transistors, and heteroepitaxial layers on silicon. Additional topics of interest are high throughput, high-quality growth techniques and fabrication methods, as well as novel forms of characterization.
Novel concepts, applications and systems enabled in part or entirely by new silicon materials and devices are also within the scope of this symposium. Examples include: large-area, low-cost and/or flexible devices, circuits and systems for applications in information display, imaging, sensing, memory, logic and wireless transmission as well as wearable devices for medical, industrial and consumer electronics applications. Submissions are encouraged on the materials science, fabrication, device application, theory, simulation and characterization in these emerging areas.