2016 MRS Spring Meeting
Symposium EP2-Silicon Carbide—Substrates, Epitaxy, Devices, Circuits and Graphene
Advances in silicon carbide materials, processing, and device design have recently resulted in the implementation of SiC-based electronics for high voltage, high temperature, and high frequency applications. This symposium will focus on new developments in basic science of SiC materials as well as rapidly maturing device and circuit technologies. The challenges in this field include understanding and decreasing defect densities in bulk SiC crystals, controlling morphology and residual impurities in homo- and hetero-epilayers, optimization of implant activation and oxide-SiC interfaces, and developing novel device structures and integrated circuits.
This symposium will bring together the crystal growers, materials engineers, modelers, physicists, and device experts needed to continue the rapid pace of silicon carbide-based technology.
Topics will include:
- Devices for efficient power conversion
- Integrated circuits for harsh environments
- SiC sensors and biomedical applications
- Graphene from SiC
- Improved ohmic and rectifying contacts
- Surfaces and interfaces
- Oxidation and alternative dielectric materials
- Bulk SiC growth (including large diameter crystals), modeling, and characterization
- Homo- and hetero-epitaxial growth (doping control, carrier lifetimes, etc.)
Invited Speakers:
- EP2_Silicon Carbide—Substrates, Epitaxy, Devices, Circuits and Graphene
_0 (Oak Ridge National Laboratory, USA)
- EP2_Silicon Carbide—Substrates, Epitaxy, Devices, Circuits and Graphene
_1 (Monash University, Australia)
- EP2_Silicon Carbide—Substrates, Epitaxy, Devices, Circuits and Graphene
_2 (National Tsing Hua University, Taiwan)
- EP2_Silicon Carbide—Substrates, Epitaxy, Devices, Circuits and Graphene
_3 (Linkoeping University, Sweden)
- EP2_Silicon Carbide—Substrates, Epitaxy, Devices, Circuits and Graphene
_4 (NASA Glenn Center, USA)
- EP2_Silicon Carbide—Substrates, Epitaxy, Devices, Circuits and Graphene
_5 (Ascatron, Sweden)
- EP2_Silicon Carbide—Substrates, Epitaxy, Devices, Circuits and Graphene
_6 (Tohoku University, Japan)
- EP2_Silicon Carbide—Substrates, Epitaxy, Devices, Circuits and Graphene
_7 (GeneSiC, USA)
- EP2_Silicon Carbide—Substrates, Epitaxy, Devices, Circuits and Graphene
_8 (Central Research Institute of Electric Power Industry, Japan)
- EP2_Silicon Carbide—Substrates, Epitaxy, Devices, Circuits and Graphene
_9 (Washington State University, USA)
- EP2_Silicon Carbide—Substrates, Epitaxy, Devices, Circuits and Graphene
_10 (NovaSiC, France)
Symposium Organizers
Francesca Iacopi
Griffith University
Queensland Micro and Nanotechnology Centre
Australia
Camilla Coletti
Istituto Italiano di Tecnologia
Italy
Sei-Hyung Ryu
Cree Inc.
USA
Stephen E. Saddow
University of South Florida
Electrical Engineering Department
USA
Carl-Mikael Zetterling
KTH Royal Institute of Technology
Sweden
Topics
C
compound
crystal
crystal growth
defects
electrical properties
electronic material
film
graphene
radiation effects
semiconducting
Si
simulation