April 7 - 11, 2025
Seattle, Washington
Symposium Supporters
2025 MRS Spring Meeting & Exhibit
EL16.13.22

Controlled Growth of Large-Area 2D TMD Films for Energy Harvesting Applications

When and Where

Apr 10, 2025
5:00pm - 7:00pm
Summit, Level 2, Flex Hall C

Presenter(s)

Co-Author(s)

Praveen Kumar1,Parna Maity1,Bhanu Khatua1,Prasana Sahoo1

Indian Institute of Technology Kharagpur1

Abstract

Praveen Kumar1,Parna Maity1,Bhanu Khatua1,Prasana Sahoo1

Indian Institute of Technology Kharagpur1
Two-dimensional transition metal dichalcogenides (2D TMDs) have garnered significant attention for their unique structural, electrical, and optical properties, which make them promising materials for energy harvesting applications. This study explores the continuous synthesis of layered-controlled MoSe2 films over centimeter-scale areas using the atmospheric pressure chemical vapour deposition (APCVD) method using selenium and molybdenum trioxide as solid precursors. Using optical microscopy, atomic force microscopy, and Raman spectroscopy, we characterized the as-synthesized 2D MoSe2 films. Remarkably, we achieved large-area MoSe2 growth on SiO2/Si substrates across different precursor amounts. However, the surface morphology, thickness, and crystallite size of MoSe2 domains were significantly influenced by the precursor quantity. Furthermore, we investigate the piezoelectric properties of CVD grown monolayer and multilayer MoSe2 films. Our findings indicate that the monolayer MoSe2 film has an exceptional piezoelectric output voltage of about 2.6 V, while the multilayer MoSe2 film has about 4.3 V. This work highlights the potential for optimizing 2D MoSe2 layer number for improved energy harvesting applications.

Keywords

chemical vapor deposition (CVD) (chemical reaction) | Raman spectroscopy

Symposium Organizers

Xudong Wang, University of Wisconsin--Madison
Miso Kim, Sungkyunkwan University
Wenzhuo Wu, Purdue University
Till Fromling, Technical University of Darmstadt

Symposium Support

Bronze
APL Electronic Devices

Session Chairs

Ruoxing Wang
Wenzhuo Wu

In this Session