Apr 10, 2025
5:00pm - 7:00pm
Summit, Level 2, Flex Hall C
Jagannath Jena1,Heather Kurtz2,Justin Woods1,Junyi Yang1,Eugene Ark1,Fateme Mahdikhany2,Vinod Sangwan2,Mark Hersam2,Anand Bhattacharya1
Argonne National Laboratory1,Northwestern University2
Jagannath Jena1,Heather Kurtz2,Justin Woods1,Junyi Yang1,Eugene Ark1,Fateme Mahdikhany2,Vinod Sangwan2,Mark Hersam2,Anand Bhattacharya1
Argonne National Laboratory1,Northwestern University2
Elemental bismuth (Bi) semimetal thin films exhibit novel spin- and charge-transport properties that arise from their high mobility Rashba spin-split surface states. However, there has been limited progress on modulation of these properties through extrinsic control such as electric field-effect. Here, we report the tunability of the electronic properties of epitaxial Bi (111) films grown on GaAs by electron double-layer gating using a hexagonal boron nitride (hBN) based ion-gel. In contrast to conventional ionic liquids, solid-state hBN ion-gel allows facile patterning on the top of prepatterned Bi Hall bars by aerosol jet printing. Magneto-transport measurements demonstrate that the application of small gate voltages (ranging from +0.4V to -0.4V) through hBN ion-gel induces significant modulation in charge carrier density and mobility of Bi thin films, leading to a pronounced response in the Hall conductivity. By varying gate voltage, we can identify electron- or hole-dominated transport in Bi films of different thicknesses. For example, 10-nm-thick Bi film shows holes dominated Hall conductivity, whereas 30-nm-thick film shows the presence of both electron and hole pockets. Thus, our work highlights the potential of a novel hBN-based solid-state ion-gel gating as a versatile materials system to engineer the electronic properties of topological materials, paving the way for future applications in advanced electronic devices.