Apr 8, 2025
4:30pm - 4:45pm
Summit, Level 4, Room 427
Danbi Kim1,2,Jae Hoon Han1,Changsoon Choi1,Jeong Ho Cho2,Jung Ah Lim1
Korea Institute of Science and Technology1,Yonsei University2
Danbi Kim1,2,Jae Hoon Han1,Changsoon Choi1,Jeong Ho Cho2,Jung Ah Lim1
Korea Institute of Science and Technology1,Yonsei University2
Near-infrared (NIR) light sensing is important in various applications, such as integrated photonics, and optical computing. Organic photodetectors (OPDs) based on low-bandgap organic semiconductors have emerged as promising candidates for NIR photodetection due to their excellent NIR absorption properties and solution processability. However, the conventional OPD structures based on a cross-bar array suffer from low responsivity to NIR light, array crosstalk, and difficult on-chip integration with photonic components. In this study, we propose a novel architecture for NIR OPDs with nanogap planar electrodes, specifically designed for integrated photonic circuits. The photoactive channel, featuring a nanogap of approximately 20 nm, was fabricated through the selective peel-off of a surface-modified metal electrode with a self-assembled monolayer. Our results show that the proposed nanogap OPDs with a bulk-heterojunction active layer exhibited high performance for 830 nm light, despite having an extremely small photoactive area. We found that the nanogap induced a plasmonic effect, enhancing light absorption in the photoactive channel. Various blend compositions of the bulk-heterojunction were investigated to understand the working principle of this device and determine the optimal performance conditions. Finally, as a proof of concept, the nanogap OPDs coupled with a waveguide demonstrated optical-to-electronic signal modulation on an integrated Si photonic device.