April 22 - 26, 2024
Seattle, Washington
May 7 - 9, 2024 (Virtual)

Event Supporters

2024 MRS Spring Meeting
EL05.03.04

A High-κ Wide-Gap Layered Dielectric for Two-Dimensional Van der Waals Heterostructures

When and Where

Apr 23, 2024
4:00pm - 4:15pm
Room 344, Level 3, Summit

Presenter(s)

Co-Author(s)

Aljoscha Söll1,Edoardo Lopriore2,Asmund Ottesen2,Jan Luxa1,Gabriele Pasquale2,Jiri Sturala1,František Hájek3,Vítězslav Jarý3,David Sedmidubský1,Kseniia Mosina1,Andras Kis2,Zdenek Sofer1

University of Chemistry and Technology, Prague1,École Polytechnique Fédérale de Lausanne2,Institute of Physics of the Czech Academy of Sciences, v.v.i.3

Abstract

Aljoscha Söll1,Edoardo Lopriore2,Asmund Ottesen2,Jan Luxa1,Gabriele Pasquale2,Jiri Sturala1,František Hájek3,Vítězslav Jarý3,David Sedmidubský1,Kseniia Mosina1,Andras Kis2,Zdenek Sofer1

University of Chemistry and Technology, Prague1,École Polytechnique Fédérale de Lausanne2,Institute of Physics of the Czech Academy of Sciences, v.v.i.3
Van der Waals heterostructures of two-dimensional materials have opened up new frontiers in condensed matter physics, unlocking unexplored possibilities in electronic and photonic device applications. However, the investigation of wide-gap high-κ layered dielectrics for devices based on van der Waals structures has been relatively limited. In this work, we demonstrate an easily reproducible synthesis method for the rare earth oxyhalide LaOBr, and we exfoliate it as a 2D layered material with a measured static out-of-plane dielectric constant of 9 and a wide bandgap of 5.3 eV. Furthermore, our research demonstrates that LaOBr can be used as a high-κ dielectric in van der Waals field-effect transistors with high performance and low interface defect concentrations. Additionally, it proves to be an attractive choice for electrical gating in excitonic devices based on 2D materials. Our work demonstrates the versatile realization and functionality of 2D systems with wide-gap and high-κ van der Waals dielectric environments.

Keywords

crystal growth | van der Waals

Symposium Organizers

Silvija Gradecak, National University of Singapore
Lain-Jong Li, The University of Hong Kong
Iuliana Radu, TSMC Taiwan
John Sudijono, Applied Materials, Inc.

Symposium Support

Gold
Applied Materials

Session Chairs

Kevin O'Brien
Aaron Thean

In this Session