Apr 24, 2024
5:00pm - 7:00pm
Flex Hall C, Level 2, Summit
Zhao Sun1,Zhuofei Gan1,Jianwen Zhong1,Liyang Chen2,Zijie Jiang1,Wendi Li1
The University of Hong Kong1,ETH Zurich2
Zhao Sun1,Zhuofei Gan1,Jianwen Zhong1,Liyang Chen2,Zijie Jiang1,Wendi Li1
The University of Hong Kong1,ETH Zurich2
In recent decades, metal halide perovskites have emerged as a highly promising class of materials for optoelectronic devices, owing to their exceptional properties, which include a tunable bandgap, a significant optical absorption coefficient within the visible light, and long carrier diffusion length<sup>[1-4]</sup>. Nonetheless, achieving high-resolution patterning of perovskite arrays presents challenges due to their inherent instability when exposed to conventional photolithography solvents. In this work, we proposed a universal approach to pattern high-resolution perovskite arrays using an ultrathin reusable metal mask. A two-step sequential approach utilizing a designed metal mask is employed to achieve the controlled fabrication of micro and nanometer-resolution perovskite arrays. Through this generic and straightforward patterning process, we successfully fabricated perovskite arrays in red, green, and blue (RGB) colors, varying in shapes and sizes, with a minimum diameter of 500 nm perovskite pixel arrays. Moreover, the patterned perovskite arrays exhibit excellent photoelectric properties, including comparable light absorption and considerable lifetime. Furthermore, we investigated a transfer method to assemble multi-color perovskite arrays, enabling the creation of full-color images that significantly contribute to the progress of screen display technologies. Additionally, we presented photodiode stack arrays with a sandwich structure for each stack, demonstrating the capability of our approach in both solution and evaporation processes, which is unprecedentedly achieved. The patterned perovskite photodiode stack arrays exhibit outstanding electronic performance, showcasing lower open circuit voltage and comparable stability under diverse levels of illumination intensity. The fabricated ultrathin and high-resolution metal mask holds significant potential in the development of micro and nanoscale photoelectronic devices such as LEDs and solar cells. This method enables the patterning of perovskite micro-arrays on versatile substrates with reusable metal mesh templates and can be further applied to other materials to facilitate the development of micro-structured optoelectronic devices.<br/><br/>References<br/>[1] W. S. Yang, J. H. Noh, N. J. Jeon, Y. C. Kim, S. Ryu, J. Seo, S. I. Seok, <i>Science</i> <b>2015</b>, 348, 1234.<br/>[2] W. Wu, X. Wang, X. Han, Z. Yang, G. Gao, Y. Zhang, J. Hu, Y. Tan, A. Pan, C. Pan, <i>Advanced Materials</i> <b>2019</b>, 31, 1805913.<br/>[3] X. Han, W. Wu, H. Chen, D. Peng, L. Qiu, P. Yan, C. Pan, <i>Advanced Functional Materials</i> <b>2021</b>, 31, 2005230.<br/>[4] L. N. Quan, B. P. Rand, R. H. Friend, S. G. Mhaisalkar, T.-W. Lee, E. H. Sargent, <i>Chemical reviews</i> <b>2019</b>, 119, 7444.