Multi-Spectral Optical Platform of Luminescent Patterns by Single-Shot Optical Lithography

Integration of numerous optical materials with different band gaps forms the basis of a multispectral technology. While step-by-step integrations are the prevailing manufacturing approach, realizations of complex patterns with increasing numbers of material units by high definition and reproducibility remain challenging, preventing the wide implications of the multispectral platform. Here, we report optical lithography to spatially control the optical band gaps of semiconductor alloys by composition modulations with a single-shot expose. Luminescent patterns with intrinsic emission wavelengths, spanning the entire visible-spectral range are designed to realize functional multispectral films. With programmed correlations between spatial and spectral information, we fabricate multivariate optical filters for dispersive optics-free spectroscopy with a high spectral resolution and wavelength-selective encoding patterns for encryptions with precise spectral programming. The fabrication is at room temperature, and compatible with various device platforms for monolithic integrations.