December 1 - 6, 2024
Boston, Massachusetts
Symposium Supporters
2024 MRS Fall Meeting & Exhibit
MT04.05.04

Atomic-Scale Insights into Polarization Mechanism in HfO2 Ferroelectrics Using Multi-Phase Machine Learning Potential

When and Where

Dec 3, 2024
8:00pm - 10:00pm
Hynes, Level 1, Hall A

Presenter(s)

Co-Author(s)

Hyo Shin1,Jun Hyeong Gu1,Eun Ho Kim1,Hyeon Kim1,Donghwa Lee1

Pohang University of Science and Technology1

Abstract

Hyo Shin1,Jun Hyeong Gu1,Eun Ho Kim1,Hyeon Kim1,Donghwa Lee1

Pohang University of Science and Technology1
Recently, HfO2 ferroelectrics have emerged as key materials for future semiconductor technologies. However, they face practical challenges due to high coercive fields and slow domain wall mobility, which impact their operational performance. To address these issues, it is essential to understand the phenomena associated with the polarization of HfO2 ferroelectrics at the atomic level. Additionally, since HfO2 has various metastable and stable phases, developing an accurate machine learning potential (MLP) that can simulate the energy stability between these multiple phases is important to reveal the polarization mechanisms at the atomic level. Therefore, in this study, we develop a multi-phase machine learning potential (MP-MLP) that accurately predicts the energy and force of various metastable and stable phases of HfO2 with quantum mechanical precision, using a graph neural network-based model. The energy order of different phases predicted by the MP-MLP matches exactly with density functional theory (DFT) calculations. We also observe polarization rotation and switching in HfO2 ferroelectricity using MP-MLP based molecular dynamics simulations under external electric field conditions and identify intermediate phases during polarization switching and rotation. These results provide atomic-level insights related to the wake-up and fatigue of HfO2 ferroelectric devices. We expect these insights to facilitate the development of more efficient semiconductor devices, enhancing the performance and reliability of future technologies.

Symposium Organizers

Kjell Jorner, ETH Zurich
Jian Lin, University of Missouri-Columbia
Daniel Tabor, Texas A&M University
Dmitry Zubarev, IBM

Session Chairs

Kjell Jorner
Jian Lin

In this Session