Optimizing Multislice Electron Ptychography for Robust Reconstructions

Multislice electron ptychography is a developing 4D STEM technique that promises three-dimensional, quantitative phase contrast imaging for a wide range of materials science problems. However, it remains difficult to implement because of the large set of acquisition and computation parameters required for a successful reconstruction. In this talk, we discuss the optimization of acquisition parameters for multislice ptychography. We introduce two physically informed metrics, areal oversampling and Ronchigram magnification, which are sufficient to inform the selection of experimental parameters. We evaluate these metrics over a wide range of metrics in simulation and experiment. Through application of these metrics, we achieve reconstructions with large scan step size, which enables large field-of-view reconstructions with minimal redundant data. Finally, we discuss the application of optimized multislice electron ptychography for quantitative phase contrast imaging.<br/><br/>References:<br/>Colin Gilgenbach, Xi Chen, James M LeBeau, A Methodology for Robust Multislice Ptychography, <i>Microscopy and Microanalysis</i>, 2024; ozae055, https://doi.org/10.1093/mam/ozae055