December 1 - 6, 2024
Boston, Massachusetts
Symposium Supporters
2024 MRS Fall Meeting & Exhibit
PM03.10.02

De-Poisoning Catalysts for Sustainable Chemical Processing

When and Where

Dec 5, 2024
2:00pm - 2:15pm
Sheraton, Third Floor, Berkeley

Presenter(s)

Co-Author(s)

Jane Chang2,3,1,Taylor Smith1,Daniel Morphet2,Zhifei Yan2,Dongtao Cui2,Kate Guerin2,Ebubechi Nwaubani2,Daniel Nocera2

University of California, Los Angeles1,Harvard University2,Harvard Radcliffe Institute3

Abstract

Jane Chang2,3,1,Taylor Smith1,Daniel Morphet2,Zhifei Yan2,Dongtao Cui2,Kate Guerin2,Ebubechi Nwaubani2,Daniel Nocera2

University of California, Los Angeles1,Harvard University2,Harvard Radcliffe Institute3
Metal catalyst enabled chemical processing produces the majority of products that we use in everyday life, from food, textiles, biodegradable plastics, pharmaceuticals, to environmentally safer fuels. Catalyst poisoning not only reduces the efficiency of these catalysts but also increases the demand for them. De-poisoning catalysts can not only improve the efficiency and sustainability of chemical processing but also address the lesser known yet serious fact that many catalysts are sourced from minerals mined in countries struggling with political instability, where the extraction of minerals is linked to environmental damage, violence, and human rights abuses.<br/><br/>Atomic layer etching (ALE) was developed in recent years to enable precision in patterning for integrating novel metal and metal alloys in nano-electronics, nano-photonics, spintronics, and sensors. Interestingly, many of the materials requiring nano-scale patterning have been used as catalysts. While a chemical reaction leading to the formation of a strongly chemisorbed species is considered poisoning in catalysis, it is a necessary step in initiating atomic layer etching of metals. The feasibility of utilizing ALE to reactivate catalysts relies on selective surface chemical reactions to remove just the poisoned layer. This presentation will focus on the intersection of two interdisciplinary research areas for nano-electronics and catalysis, leveraging what was achieved in ALE of metals to help de-poison/regenerate the catalysts. The specific example focuses on using Cu as a catalyst for CO<sub>2</sub> reduction, where sulfur and carbon (coking) poisoning through the use of model compounds served to deactivate the catalyst. Different plasma chemistries (e.g., Ar, O<sub>2</sub>, N<sub>2</sub>) are evaluated to assess the physical and chemical effects of the discharge on modifying the surface morphology, microstructure and composition. The Faradaic efficiency in the formation of main gases and liquid products (e.g., CH<sub>4</sub>, formate, ethanol) is used to assess the efficacy of the plasma enhanced ALE processes in de-poisoning catalysts. The results demonstrated the feasibility of utilizing ALE to remedy catalyst poisoning, highlighting the effect of surface microstructure on catalytic selectivity, thereby making the catalytic processing more sustainable and effective.

Keywords

atomic layer etching

Symposium Organizers

Rebecca Anthony, Michigan State University
I-Chun Cheng, National Taiwan University
Lorenzo Mangolini, University of California, Riverside
Davide Mariotti, University of Strathclyde

Session Chairs

Uwe Kortshagen
Davide Mariotti

In this Session