Dec 5, 2024
11:30am - 11:45am
Sheraton, Fifth Floor, Riverway
Ari Turkiewicz1,Abigail Jiang1,Grace Pan1,Dan Ferenc Segedin1,Suk Hyun Sung1,Nicole Taylor1,Charles Brooks1,Ismail El Baggari1,Jarad Mason1,Julia Mundy1
Harvard University1
Ari Turkiewicz1,Abigail Jiang1,Grace Pan1,Dan Ferenc Segedin1,Suk Hyun Sung1,Nicole Taylor1,Charles Brooks1,Ismail El Baggari1,Jarad Mason1,Julia Mundy1
Harvard University1
Since the discovery of superconductivity in infinite-layer nickelates, there have been continuous efforts to identify related materials with improved properties. Theoretical and experimental studies suggest that increasing the dimensional confinement across nickel oxide layers will lead to more ‘cuprate-like’ physics and higher superconducting critical temperatures. Here, we target thin films of the <i>n</i> = 1 Ruddlesden-Popper phase, La<sub>2</sub>NiO<sub>4</sub>, which boasts single layers of electronically isolated nickel oxide. In the parent structure, nickel adopts a 2+ oxidation state with ground state antiferromagnetic ordering. Notably, the ground state magnetic structure of the high-<i>T</i><sub>C</sub> cuprates is proximate to an antiferromagnetically ordered phase. We therefore use two complementary methods to tune the nickel valence and ground-state magnetic properties. First, we use molecular-beam epitaxy (MBE) to synthesize thin films of the general formula La<sub>2−<i>x</i></sub><i>A<sub>x</sub></i>NiO<sub>4</sub> (<i>A</i> = Sr, Ba) where nickel adopts an oxidation state of 2+<i>x</i>. After MBE synthesis, we leverage topochemical transformations including fluorine substitution and reductive de-intercalation [1,2] to synthesize thin films of the general formula La<sub>2−<i>x</i></sub><i>A<sub>x</sub></i>NiO<sub>3</sub>F<sub>2−<i>y</i></sub> where nickel adopts an oxidation state of 2+<i>x</i>−<i>y</i>. Through these two methods, we can both electron- and hole-dope the nickel oxide layer, systemically probing the effect of valence on magnetic and electronic properties.<br/><br/>1.<i> Inorg. Chem.</i> <b>2018</b>, <i>57</i>, 6549−6560<br/>2.<i> Chem. Mater.</i> <b>2020</b>, <i>32</i>, 3160−3179