Crosslinking-Assisted Indirect Photopatterning of Quantum Dots

Micrometer-scale patterns of quantum dots (QDs) with exceptional fidelity are formed using crosslinking-assisted, photoresist-guided indirect (PIN) photopatterning without compromising their luminescence characteristics. The method employs a crosslinker which is activated at low temperatures below 130 °C. Thanks to the sufficiently low processing temperature, the luminous properties of QDs (including their photoluminescence and electroluminescence characteristics) are preserved and the QD films are crosslinked without affecting the underlying photoresist pre-patterns which serve as structural guides in during QD pattern formation. By using PIN photopatterning, we form high-fidelity RGB QD patterns with pixel densities exceeding 4000 pixels per inch. The compatibility of PIN photopatterning with the apparatus used in the display industry signifies its application potential.