December 1 - 6, 2024
Boston, Massachusetts
Symposium Supporters
2024 MRS Fall Meeting & Exhibit
EL07.09.03

Enhancing Spin Photocurrent in Scalable Monolayer MoS2 Plasmonic Phototransistors Using Chiral Metasurfaces

When and Where

Dec 3, 2024
5:00pm - 5:15pm
Sheraton, Second Floor, Back Bay D

Presenter(s)

Co-Author(s)

Shyr-Shyan Yeh1,2,Chen-Yu Wang1,2,Tzu-Yu Peng1,2,Jia-Wern Chen1,2,Kai Qi3,Jui-Han Fu3,Vincent Tung3,Yu-Jung Lu1,2

Academia Sinica1,National Taiwan University2,The University of Tokyo3

Abstract

Shyr-Shyan Yeh1,2,Chen-Yu Wang1,2,Tzu-Yu Peng1,2,Jia-Wern Chen1,2,Kai Qi3,Jui-Han Fu3,Vincent Tung3,Yu-Jung Lu1,2

Academia Sinica1,National Taiwan University2,The University of Tokyo3
The broken inversion symmetry and valley-selection rule due to the different spin orientations within the split valence band of each K(K’) valleys in monolayer MoS2 (1L-MoS2) justifies their potential applications for spintronic devices, valley-sensitive optoelectronic devices and quantum-based information processing. However, the ability to distinguish the degree of freedom between left/right circularly polarized (L/RCP) spin photocurrent is still a challenge due to the low photoresponsivity and lack of polarization sensitivity in 1L-MoS2 at room temperature conditions. To counter these concerns, we propose a spin photocurrent sensitive plasmonic phototransistors with wafer-scaled 1L-MoS2 integrated with gold chiral metasurfaces upon a hafnium nitride substrate. The geometry and handedness of the chiral metasurfaces were designed via finite-difference time-domain (FDTD) methods and the calculated absorption spectra signified that the left/right handed orientation of the gold chiral plasmonic metasurfaces dictates the selective absorption enhancement of L/RCP light (or vice versa) upon the 1L-MoS2 surface. An additional plasmonic hafnium nitride material (deposited via RF-magnetron sputtering at 800°C) was introduced as a gate electrode with excellent metallic properties and strong local surface plasmon resonance attributes within the visible spectrum [1,2]. The inclusion of hafnium nitride plays a crucial role in amplifying the light-matter interaction upon the 1L-MoS2 layer, where a 4-fold enhancement factor was observed from the photocurrent measurements (in comparison to pristine p+-Si substrate). Spin photocurrent measurements at different wavelengths showed up to 30.02% change at 660 nm (on-resonance with MoS2) and less than 10% change at 450 nm and 550 nm (off-resonance). Overall, these promising results reveal a clear distinguishable approach to manipulate and tailor the L/RCP spin photocurrent at room temperature conditions. Ultimately, we will discuss the potential applications of ultrathin plasmonic phototransistors with high spin-selective photoresponse.

Reference
[1] Z-Y Chiao, Y-C Chen, J-W Chen, Y-C Chu, J-W Yang, T-Y Peng, W-R Syong, H W H. Lee, S-W Chu, and Y-J Lu*, Full-Color Generation Enabled by Refractory Plasmonic Crystals. Nanophotonics 11, 2891-2899 (2022)
[2] Y-H Hsieh, B-W Hsu, K-N Peng, K-W Lee, C W Chu, S-W Chang, H-W Lin*, T-J Yen*, and Y-J Lu*, Perovskite Quantum Dot Lasing in a Gap-Plasmon Nanocavity with Ultralow Threshold, ACS Nano 14, 11670 (2020).

Keywords

2D materials

Symposium Organizers

Viktoriia Babicheva, University of New Mexico
Ho Wai (Howard) Lee, University of California, Irvine
Melissa Li, California Institute of Technology
Yu-Jung Lu, Academia Sinica

Symposium Support

Bronze
APL Quantum
Enlitech
Walter de Gruyter GmbH

Session Chairs

Min Seok Jang
Laura Kim

In this Session