Dec 3, 2024
5:00pm - 5:15pm
Sheraton, Second Floor, Back Bay D
Shyr-Shyan Yeh1,2,Chen-Yu Wang1,2,Tzu-Yu Peng1,2,Jia-Wern Chen1,2,Kai Qi3,Jui-Han Fu3,Vincent Tung3,Yu-Jung Lu1,2
Academia Sinica1,National Taiwan University2,The University of Tokyo3
Shyr-Shyan Yeh1,2,Chen-Yu Wang1,2,Tzu-Yu Peng1,2,Jia-Wern Chen1,2,Kai Qi3,Jui-Han Fu3,Vincent Tung3,Yu-Jung Lu1,2
Academia Sinica1,National Taiwan University2,The University of Tokyo3
The broken inversion symmetry and valley-selection rule due to the different spin orientations within the split valence band of each K(K’) valleys in monolayer MoS
2 (1L-MoS
2) justifies their potential applications for spintronic devices, valley-sensitive optoelectronic devices and quantum-based information processing. However, the ability to distinguish the degree of freedom between left/right circularly polarized (L/RCP) spin photocurrent is still a challenge due to the low photoresponsivity and lack of polarization sensitivity in 1L-MoS
2 at room temperature conditions. To counter these concerns, we propose a spin photocurrent sensitive plasmonic phototransistors with wafer-scaled 1L-MoS
2 integrated with gold chiral metasurfaces upon a hafnium nitride substrate. The geometry and handedness of the chiral metasurfaces were designed
via finite-difference time-domain (FDTD) methods and the calculated absorption spectra signified that the left/right handed orientation of the gold chiral plasmonic metasurfaces dictates the selective absorption enhancement of L/RCP light (or vice versa) upon the 1L-MoS
2 surface. An additional plasmonic hafnium nitride material (deposited via RF-magnetron sputtering at 800°C) was introduced as a gate electrode with excellent metallic properties and strong local surface plasmon resonance attributes within the visible spectrum [1,2]. The inclusion of hafnium nitride plays a crucial role in amplifying the light-matter interaction upon the 1L-MoS
2 layer, where a 4-fold enhancement factor was observed from the photocurrent measurements (in comparison to pristine
p+-Si substrate). Spin photocurrent measurements at different wavelengths showed up to 30.02% change at 660 nm (on-resonance with MoS
2) and less than 10% change at 450 nm and 550 nm (off-resonance). Overall, these promising results reveal a clear distinguishable approach to manipulate and tailor the L/RCP spin photocurrent at room temperature conditions. Ultimately, we will discuss the potential applications of ultrathin plasmonic phototransistors with high spin-selective photoresponse.
Reference[1] Z-Y Chiao, Y-C Chen, J-W Chen, Y-C Chu, J-W Yang, T-Y Peng, W-R Syong, H W H. Lee, S-W Chu, and
Y-J Lu*, Full-Color Generation Enabled by Refractory Plasmonic Crystals.
Nanophotonics 11, 2891-2899 (2022)
[2] Y-H Hsieh, B-W Hsu, K-N Peng, K-W Lee, C W Chu, S-W Chang, H-W Lin*, T-J Yen*, and
Y-J Lu*, Perovskite Quantum Dot Lasing in a Gap-Plasmon Nanocavity with Ultralow Threshold,
ACS Nano 14, 11670 (2020).