December 1 - 6, 2024
Boston, Massachusetts
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2024 MRS Fall Meeting & Exhibit
EL05.11.04

Impact of the Incorporation of In and Cu Dopants into β-Ga2O3 Nanostructures for Resistive Switching Applications

When and Where

Dec 5, 2024
8:00pm - 10:00pm
Hynes, Level 1, Hall A

Presenter(s)

Co-Author(s)

Asma Al Ghaithi1,Haila Aldosari1

United Arab Emirates University1

Abstract

Asma Al Ghaithi1,Haila Aldosari1

United Arab Emirates University1
The ultra-wide bandgap semiconductor beta gallium oxide (β-Ga2O3) has become a potential candidate for power electronics, ultraviolet optoelectronics, high-temperature gas sensors, and memristors. β-Ga2O3 exhibits outstanding properties, including a bandgap of 4.5–4.9 eV, a high critical electric field of around 8 MV/cm, a high Baliga's figure of merit (BFoM), and good stability at elevated temperatures. Doping and transitioning from bulk single crystal to micro- and nano-crystallite promotes the unique features of β-Ga2O3, resulting from larger surface-to-volume ratios, fewer defects, and reduced strain. This study investigates the impact of the incorporation of indium (In) and copper (Cu) with the precursor material during the synthesis process on the structural, morphological, and optical properties of the β-Ga2O3 nanostructures (NS) obtained by the conventional CVD method. The β-Ga2O3 NS were grown on a (100) p-type silicon substrate inside a quartz tube furnace at 900 °C for 2 h with an argon flow of 30 SCCM. Ga was used as a precursor material mixed with different ratios of In or Cu (1:0, 3:1, 2:1). Various characterization techniques were used in this investigation, including grazing-incidence X-ray diffraction (GIXRD), scanning electron microscopy (SEM), energy dispersive spectrometry (EDS), and UV-visible- NIR spectrophotometry. GIXRD scans showed that all NS exhibit the β-Ga2O3 phase with the monoclinic crystal structure (space group C2/m) and dominant orientation along the (111) plane. No additional peaks of other Ga2O3 polymorphs were detected, and the strong diffraction peaks indicate the high crystalline quality of the β-Ga2O3 NS. SEM images demonstrated that pure Ga formed short β-Ga2O3 nanorods of diameter varies from 400 nm up to 800 nm and length between 600 nm and 1 µm. Although the diameter remained the same, the nanorods became considerably longer, reaching a length of about 1 µm – 5 µm, when Ga was combined with In or Cu with a small amount. β-Ga2O3nanorods transitioned into nanoplates and nanosheets at a further increase in the In and Cu concentrations. EDS analysis revealed the presence of Ga and O and a small amount of In and Cu traces. All β-Ga2O3 NS has exceptional transparency in the visible and ultraviolet wavelength ranges, with an optical bandgap of 4.56 eV, which was slightly reduced to 4.50 eV as the concentration of In and Cu increased. The current-voltage characteristics of the NS demonstrated promising resistive switching characteristics, which included bipolar resistive switching, a low operation voltage, and strong repeatability and retention.

Keywords

chemical vapor deposition (CVD) (deposition) | nanostructure | oxide

Symposium Organizers

Paschalis Gkoupidenis, Max Planck Institute
Francesca Santoro, Forschungszentrum Jülich/RWTH Aachen University
Ioulia Tzouvadaki, Ghent University
Yoeri van de Burgt, Technische Universiteit Eindhoven

Session Chairs

Sahika Inal
Ioulia Tzouvadaki

In this Session