December 1 - 6, 2024
Boston, Massachusetts
Symposium Supporters
2024 MRS Fall Meeting & Exhibit
PM03.07.04

Enhancing Ohmic Contacts in β-Ga2O3 via N2 Plasma Treatment

When and Where

Dec 4, 2024
8:00pm - 10:00pm
Hynes, Level 1, Hall A

Presenter(s)

Co-Author(s)

Junghun Kim1,Dongryul Lee2,Jihyun Kim3

Korea Electrotechnology Research Institute1,Samsung Electronics2,Seoul National University3

Abstract

Junghun Kim1,Dongryul Lee2,Jihyun Kim3

Korea Electrotechnology Research Institute1,Samsung Electronics2,Seoul National University3
β-Ga2O3 has emerged as a highly promising material for next-generation power semiconductors due to its exceptional properties such as high theoretical breakdown field and Baliga's figure-of-merit. However, the performance of β-Ga2O3-based devices, including SBDs and MOSFETs, is often hindered by the presence of high contact resistance between the Ga2O3 and metal contacts. This resistance limits device efficiency by increasing switching and conduction losses.
Conventional methods for reducing contact resistance include: 1) rapid thermal annealing (RTA) to enhance interface defects between metal and semiconductor, and 2) ion implantation to increase doping concentration beneath metal contacts. However, post-metallization annealing (400–500°C) may lead to interfacial degradation, potentially restricting the front-end-of-line process for Ga2O3. Moreover, ion implantation for doping can cause damage to the semiconductor lattice.
In this study, a novel annealing-free N2 plasma treatment for achieving Ohmic contacts was demonstrated. This simple treatment successfully reduced the contact resistance to 13.1 kΩμm through a defect-compensating effect. X-ray photoelectron spectroscopy (XPS) was employed to verify the impact of N2 plasma treatment on Ga2O3 bonds, while Raman spectroscopy assessed the crystalline quality of the plasma-treated region. β-Ga2O3 nanosheet FETs treated with N2 plasma exhibited an impressive on/off ratio of ~1010 and a field-effect mobility of 103.7 cm2/Vs. To validate the air-stability of the N2 plasma-treated devices, electrical measurements were conducted seven days after fabrication. This work presents a robust method to reduce contact resistance using a simple process, pushing the boundaries of β-Ga2O3 device performance.

This research was financially supported by the Korea Research Institute for Defense Technology Planning and Advancement (KRIT) grant funded by the Defense Acquisition Program Administration (DAPA) (KRIT-CT-22-046)

Keywords

defects | interface | surface chemistry

Symposium Organizers

Rebecca Anthony, Michigan State University
I-Chun Cheng, National Taiwan University
Lorenzo Mangolini, University of California, Riverside
Davide Mariotti, University of Strathclyde

Session Chairs

Rebecca Anthony
Lorenzo Mangolini

In this Session