December 1 - 6, 2024
Boston, Massachusetts
Symposium Supporters
2024 MRS Fall Meeting & Exhibit
NM04.08.01

Interaction-Induced Gap and Gate Tunable Magnetism in Suspended Rhombohedral Few-Layer Graphene

When and Where

Dec 5, 2024
1:30pm - 2:00pm
Hynes, Level 1, Room 110

Presenter(s)

Co-Author(s)

Chun Ning (Jeanie) Lau1

The Ohio State University1

Abstract

Chun Ning (Jeanie) Lau1

The Ohio State University1
The flat dispersion in rhombohedral stacked <i>N</i>-layer graphene, where <i>E~k<sup>N</sup></i>, gives rise to diverging (for <i>N&gt;</i>2) density of states that are unstable to enormous electronic interactions, leading to the formation of electronic states with spontaneous broken symmetries. In free-standing samples, the electronic interactions are further strengthened due to the absence of screening. Using transport measurements on suspended dual-gated devices, we observe an insulating ground state with a large interaction-induced gap up to 80 meV at half filling. This gapped state can be enhanced by a perpendicular magnetic field, and suppressed by an interlayer potential, carrier density, or a critical temperature of ~40 K, and is most likely a layer antiferromagnet. Upon small doping, we observe prominent conductance hysteresis and giant magnetoconductance that exceeds 1000% as a function of magnetic fields. Both phenomena are tunable by density and temperature, and disappear at <i>n&gt;</i>10<sup>12</sup> cm<sup>-2</sup> or <i>T</i>&gt;5K. These results are confirmed by first principles calculations, which indicate the formation of a half-metallic state in doped r-FLG, in which the magnetization is tunable by electric field. Our results demonstrate that magnetism and spin polarization, arising from the strong electronic interactions in flat bands, emerge in a system composed entirely of carbon atoms. In the future, different ground states are expected to be stabilized by substrate engineering. Finally I will discuss a technique to make more robust suspended gates.

Keywords

electrical properties

Symposium Organizers

Sanghoon Bae, Washington University in Saint Louis
Jeehwan Kim, Massachusetts Institute of Technology
Ho Nyung Lee, Oak Ridge National Laboratory
Nini Pryds, Technical University Denmark

Session Chairs

Chun Ning (Jeanie) Lau
Yun Seog Lee

In this Session