December 1 - 6, 2024
Boston, Massachusetts
Symposium Supporters
2024 MRS Fall Meeting & Exhibit
NM05.16.08

Synthesis and Characterization of the 2D Layered Heterostructure Bismuth Triiodide—Graphene

When and Where

Dec 6, 2024
9:45am - 10:00am
Hynes, Level 2, Room 207

Presenter(s)

Co-Author(s)

Laura Fornaro1,Camila Maidana1,Heinkel Bentos Pereira1,Ana Noguera1,Alvaro Olivera1

Universidad de la República1

Abstract

Laura Fornaro1,Camila Maidana1,Heinkel Bentos Pereira1,Ana Noguera1,Alvaro Olivera1

Universidad de la República1
Among the new emerging 2D materials, bismuth tri-iodide-graphene heterostructure has been reported both theoretical and experimentally, displaying intriguing properties. These findings suggest potential photovoltaic applications for BiI<sub>3</sub> layers and van der Waals superstructures. In this context, the present work reports the growth and characterization of the heterostructure BiI<sub>3</sub>–graphene. The growth was performed in a chamber designed and built in our laboratory, through physical vapor deposition, by first nucleating BiI<sub>3</sub> on graphene-covered substrates pre-treated with UV/O<sub>3</sub>, then allowing it to grow by non-classical attachment mechanisms followed by thermal annealing and post growth, up to three times (initial pressure 0.001-0.0001 Pa, sublimation temperature of BiI<sub>3</sub> for nucleation and post-growth 262±2°C, substrate temperature 40±1°C, thermal annealing at 150±1°C during 3600 s, post-growth (after annealing) from 120 to 600 s). The heterostructure was characterized by Bragg-Brentano X-Ray Diffraction (XRD), Grazing Incidence XRD (GIXRD), X-Ray reflectometry (XRR), High Resolution Transmission Electron Microscopy (HR-TEM), Energy Dispersive Spectroscopy (EDS), Selected Area Electron Diffraction (SAED), Fast Fourier Transform (FFT) analysis, High Resolution Scanning Electron Microscopy (HR-SEM), Atomic Force Microscopy (AFM), X-Ray Photoelectron Spectroscopy (XPS), Raman Spectroscopy and diffuse reflectance spectroscopy with integrating sphere. TEM grids and ultra-flat silicon substrates, both covered with graphene, were used as substrates, according to the characterization needs. Results show that nucleation proceeds through a non-classical mechanism with metastable amorphous entities that later pass to crystalline forms about 4 nm in size, growing through non-classical mechanisms of “oriented attachment” and “amorphous addition”. Entities are oriented with their <i>c</i>-axis perpendicular to the substrate. After the annealing and post-growth, structures obtained on substrates result in layers, with thicknesses in the range 7.6 to 35 nm, with roughness in the range 0.4 to 6 nm. The obtained heterostructures are uniform and aligned, without twisting (no Moire interference observed neither in HR-TEM images nor SAED diagrams). As the thickness decreases, the position of the (<i>0 0 3</i>) reflection peak in the diffraction pattern shifts to lower values and broadens, indicating an expansion of the cell along the <i>c</i>-axis. XRD and HR-TEM verify BiI<sub>3</sub> composition as well as the layer orientation with their <i>c</i>-axis perpendicular to the substrate. HR-TEM images of the structures show lattice planes with nearly perfect atomic arrangement, suggesting a single-crystalline nature, with a predominantly lattice spacing of 0.35 nm, which can be attributed to the (<i>1 1 0</i>) planes of BiI<sub>3</sub> hexagonal structure The FFT of the structure further confirms its single crystal nature and displays spots in a hexagonal symmetry, which can be indexed to the BiI<sub>3</sub> hexagonal structure along [<i>0 0 l</i>] zone axis. HR-SEM images verify the substrate continuous coverage, and AFM measurements confirm the roughness of the layers. XPS analysis gives peaks for Bi 4f<sub>5/2</sub> (165.2 eV) and 4f<sub>7/2 </sub>(159.8 eV), I 3d<sub>3/2 </sub>(631.0 eV) and 3d<sub>5/2</sub> (619.3 eV) which can be attributed to the characteristic signals from I<sup>-</sup> and Bi<sup>3+</sup> species, respectively, as far as the C-C from C sp<sub>2</sub> bond (284.7 eV), showing there are no chemical reactions between graphene and BiI<sub>3</sub> which then only interact through weak van der Waals interaction. Raman spectra show a peak around 115.2 cm<sup>-1</sup>, which represents out-plane Ag Raman mode. All these results agree with previously reported values for layers of this heterostructure. The obtained bandgap values, ranging from 1.55 to 1.62eV, closely align with theoretical predictions. The obtained results pose these structures as part of the 2D universe of other similar materials, such as TMDs-graphene, and open up exciting possibilities for new properties and applications.

Keywords

epitaxy | nucleation & growth | physical vapor deposition (PVD)

Symposium Organizers

Andras Kis, Ecole Polytechnique Federale de Lausanne
Li Lain-Jong, University of Hong Kong
Ying Wang, University of Wisconsin, Madison
Hanyu Zhu, Rice University

Session Chairs

Maria Hilse
Joonki Suh

In this Session