December 1 - 6, 2024
Boston, Massachusetts
Symposium Supporters
2024 MRS Fall Meeting & Exhibit
EL02.03.03

TiTe2/PCM Heterostructures—Epitaxial Growth, Interface Formation and Stability

When and Where

Dec 3, 2024
9:30am - 9:45am
Sheraton, Second Floor, Republic A

Presenter(s)

Co-Author(s)

Christian Petrucci1,Simone Prili1,2,Antonio Massimiliano Mio2,Flavia Righi Riva1,Sabrina Calvi1,Sara De Simone2,Valentina Mussi2,Adriano Diaz Fattorini1,Massimo Longo2,3,Raffaella Calarco2,Fabrizio Arciprete1,2

Università degli Studi di Roma Tor Vergata1,Consiglio Nazionale delle Ricerche2,University of Rome Tor Vergata3

Abstract

Christian Petrucci1,Simone Prili1,2,Antonio Massimiliano Mio2,Flavia Righi Riva1,Sabrina Calvi1,Sara De Simone2,Valentina Mussi2,Adriano Diaz Fattorini1,Massimo Longo2,3,Raffaella Calarco2,Fabrizio Arciprete1,2

Università degli Studi di Roma Tor Vergata1,Consiglio Nazionale delle Ricerche2,University of Rome Tor Vergata3
Device non-idealities, particularly resistance drift, electromigration, and high reset current, significantly limit the widespread of Phase Change Materials (PCM) -based memory cells. In this context, PCM-based heterostructures (PCHs) have shown the potential to overcome these limitations, where the key role of the interfaces between alternating layers has been lately highlighted [1]. Very recently, PCH composed of PCMs and two-dimensional (2D) chalcogenides as confinement materials (CMs) were realized, addressing several drawbacks of standard phase change memories. Notably, intercalating Sb2Te3 with TiTe2 has shown promising results, producing PCM cells with reduced drift and reset current [2]. However, the stability of such structures is still debated, especially regarding the intermixing and the persistence of the TiTe2 layers after cycling [3].
In this work, we aim at studying the stability of the interfaces in heterostructures based on TiTe2 and Sb2Te3 or Ge-Sb-Te (GST). In this regard, we have investigated the epitaxial growth of the single layers, in order to produce highly ordered PCH. Samples grown by Molecular Beam Epitaxy (MBE) were analyzed by in situ X-ray Photoemission Spectroscopy (XPS) to characterize their electronic properties, to assess the film composition and to evaluate intermixing. The crystal structure of as-grown, as well as annealed, epitaxial layers was evaluated by X-ray Diffraction (XRD), Raman spectroscopy and High-Resolution Scanning Transmission Electron Microscopy (HR-STEM).The epitaxy of TiTe2, Sb2Te3 and GST was obtained on Mica after a fine tuning of the relevant parameters such as: growth temperature, flux ratios and deposition rate.
The formation of the interface between TiTe2 and Sb2Te3 was evaluated by in situ XPS for increasing thicknesses of TiTe2 deposited on Sb2Te3. The analysis of the Sb, Te, and Ti core levels and their evolution with TiTe2 coverage suggests the formation of a sharp interface without significant intermixing at the growth temperature. This result is supported by HR-STEM and Raman spectroscopy. Highly ordered epitaxial TiTe2/Sb2Te3 and TiTe2/GST multilayers where then grown and characterized by XRD, Raman spectroscopy and HR-STEM. The structure and the local chemical composition of as grown and annealed PCHs were investigated by correlated Energy X-ray Dispersive Spectroscopy and Electron Energy Loss Spectroscopy. The stability of the interfaces and TiTe2 layers upon thermal treatment at temperatures up to 400 °C will be discussed.


REFERENCES
1. A.I.Khan, et al., Nano Letters 22. 6285 (2022).
2. K.Ding, et al., Science 366, 210 (2019).
3. G.Cohen, et al., Phys. Status Solidi RRL 2300426 (2024).

Keywords

molecular beam epitaxy (MBE) | van der Waals

Symposium Organizers

Fabrizio Arciprete, University of Rome Tor Vergata
Valeria Bragaglia, IBM Research Europe - Zurich
Juejun Hu, Massachusetts Institute of Technology
Andriy Lotnyk, Leibniz Institute of Surface Engineering

Session Chairs

Riccardo Mazzarello
Olivier Thomas

In this Session