Synchrotron X-Ray Scattering for In Situ Characterization of Thin Film Morphology and Structure—An Overview from ALBA Synchrotron

The use of synchrotron X-ray scattering has emerged as an essential tool to probe and understand the morphology and structure of thin films. The high brilliance and tunability of synchrotron light enable new <i>in situ</i> and <i>in operando </i>characterization possibilities during thin film nucleation, growth, post-processing, and active functioning. Specifically, Grazing Incidence Small Angle X-ray Scattering (GISAXS) provides crucial insights into the size, shape, and arrangement of nanoscale structures, whereas Grazing Incidence Wide Angle X-ray Scattering (GIWAXS) offers detailed information on the crystallographic structure, orientation, and phase transitions within the material. Additionally, a parallel multi-technique approach during synchrotron characterization enhances the results by parallelizing techniques and methodologies to record information, resulting in a more comprehensive and detailed understanding of the material's properties by capturing a wide range of data simultaneously and efficiently.<br/><br/>Following a brief introduction to X-ray scattering, this presentation will describe examples of <i>in situ</i> characterization during thin film nucleation, growth, and post-processing from various fields. The methodology, specialized instrumentation, and results will be discussed, drawing from research conducted at the NCD-SWEET beamline, the X-ray scattering facility at ALBA synchrotron in Spain. For instance, topics will include the <i>in situ</i> thin film growth using an adapted spin coating system, the <i>in situ</i> thermal sintering of supported nanocatalysts, and the <i>in situ</i> multi-technique ultra-fast growth (1000 nm/s) of superconducting thin films. Brief descriptions of complementary examples will highlight the diverse applications and capabilities of synchrotron X-ray scattering in thin film research.