Synchrotron X-Ray Scattering for In Situ Characterization of Thin Film Morphology and Structure—An Overview from ALBA Synchrotron

The use of synchrotron X-ray scattering has emerged as an essential tool to probe and understand the morphology and structure of thin films. The high brilliance and tunability of synchrotron light enable new in situ and in operando characterization possibilities during thin film nucleation, growth, post-processing, and active functioning. Specifically, Grazing Incidence Small Angle X-ray Scattering (GISAXS) provides crucial insights into the size, shape, and arrangement of nanoscale structures, whereas Grazing Incidence Wide Angle X-ray Scattering (GIWAXS) offers detailed information on the crystallographic structure, orientation, and phase transitions within the material. Additionally, a parallel multi-technique approach during synchrotron characterization enhances the results by parallelizing techniques and methodologies to record information, resulting in a more comprehensive and detailed understanding of the material's properties by capturing a wide range of data simultaneously and efficiently.

Following a brief introduction to X-ray scattering, this presentation will describe examples of in situ characterization during thin film nucleation, growth, and post-processing from various fields. The methodology, specialized instrumentation, and results will be discussed, drawing from research conducted at the NCD-SWEET beamline, the X-ray scattering facility at ALBA synchrotron in Spain. For instance, topics will include the in situ thin film growth using an adapted spin coating system, the in situ thermal sintering of supported nanocatalysts, and the in situ multi-technique ultra-fast growth (1000 nm/s) of superconducting thin films. Brief descriptions of complementary examples will highlight the diverse applications and capabilities of synchrotron X-ray scattering in thin film research.