Etching of Scandium-Doped Aluminum Nitride using Inductively Coupled Plasma Dry Etch and Tetramethyl Ammonium Hydroxide

Apr 25, 2023
11:00am - 11:15am

EL18-virtual

Zadid Shifat

Arjun Aryal

Tito Busani

Zadid Shifat^1,2,Isaac Stricklin^1,2,Ravi Kiran Chityala^1,2,Arjun Aryal^1,2,Giovanni Esteves³,Aleem Siddiqui³,Tito Busani^1,2

The University of New Mexico¹,UNM Center for High Technology Materials²,Sandia National Laboratories³

chemical reaction | plasma-enhanced CVD (PECVD) (chemical reaction)

Ho-Hsiu Chou, National Tsing Hua University

Francisco Molina-Lopez, KU Leuven

Sihong Wang, University of Chicago

Xuzhou Yan, Shanghai Jiao Tong University

Bronze
Azalea Vision
MilliporeSigma
Device, Cell Press

Sihong Wang

Xuzhou Yan