Improving the SiO₂to SiN_xEtch Selectivity During Atomic layer Etching and Reactive Ion Etching

Nov 28, 2023
10:30am - 11:00am

Sheraton, Second Floor, Independence East

Sumit Agarwal¹

Colorado School of Mines¹

atomic layer etching | infrared (IR) spectroscopy | reactive ion etching

Rebecca Anthony, Michigan State University

Fiorenza Fanelli, Consiglio Nazionale delle Ricerche

Tsuyohito Ito, The University of Tokyo

Lorenzo Mangolini, University of California, Riverside

Rebecca Anthony

Davide Mariotti

Improving the SiO2 to SiNx Etch Selectivity During Atomic layer Etching and Reactive Ion Etching