November 26 - December 1, 2023
Boston, Massachusetts
Symposium Supporters
2023 MRS Fall Meeting & Exhibit
EL07.06.26

Atomic Layer Etch of Tungsten Disulfide Semiconductor using Downstream Plasma Treatment and Wet Etch Removal

When and Where

Nov 28, 2023
8:00pm - 10:00pm
Hynes, Level 1, Hall A

Presenter(s)

Co-Author(s)

Young-Hyun You1,Joonyup Bae1,Jihyun Kim1

Seoul National University1

Keywords

2D materials | atomic layer etching | oxidation

Symposium Organizers

Gabriela Borin Barin, Empa
Shengxi Huang, Rice University
Yuxuan Cosmi Lin, TSMC Technology Inc
Lain-Jong Li, The University of Hong Kong

Symposium Support

Silver
Montana Instruments

Bronze
Oxford Instruments WITec
PicoQuant
Raith America, Inc.

Session Chairs

Yuxuan Cosmi Lin
Xu Zhang

In this Session