Atomic Layer Etch of Tungsten Disulfide Semiconductor using Downstream Plasma Treatment and Wet Etch Removal

Nov 28, 2023
8:00pm - 10:00pm

Hynes, Level 1, Hall A

Joonyup Bae

Jihyun Kim

Young-Hyun You¹,Joonyup Bae¹,Jihyun Kim¹

Seoul National University¹

2D materials | atomic layer etching | oxidation

Gabriela Borin Barin, Empa

Shengxi Huang, Rice University

Yuxuan Cosmi Lin, TSMC Technology Inc

Lain-Jong Li, The University of Hong Kong

Silver
Montana Instruments

Bronze
Oxford Instruments WITec
PicoQuant
Raith America, Inc.

Yuxuan Cosmi Lin

Xu Zhang