November 26 - December 1, 2023
Boston, Massachusetts
Symposium Supporters
2023 MRS Fall Meeting
EL07.06.26

Atomic Layer Etch of Tungsten Disulfide Semiconductor using Downstream Plasma Treatment and Wet Etch Removal

When and Where

Nov 28, 2023
8:00pm - 10:00pm
Hynes, Level 1, Hall A

Presenter(s)

Co-Author(s)

Young-Hyun You1,Joonyup Bae1,Jihyun Kim1

Seoul National University1

Keywords

2D materials | atomic layer etching | oxidation

Symposium Organizers

Gabriela Borin Barin, Empa
Shengxi Huang, Rice University
Yuxuan Cosmi Lin, TSMC Technology Inc
Lain-Jong Li, The University of Hong Kong

Symposium Support

Silver
Montana Instruments

Bronze
Oxford Instruments WITec
PicoQuant
Raith America, Inc.

Session Chairs

Yuxuan Cosmi Lin
Xu Zhang

In this Session