Mist CVD Modulated High-κ a-Al_1-xTi_xO_y Films for p-WS_0.3Se_1.7-Channel Metal Oxide Field Effect Transistors (MOSFETs)

Nov 28, 2023
8:00pm - 10:00pm

Hynes, Level 1, Hall A

Abdul Kuddus

Keiji Ueno

Abdul Kuddus¹,Kojun Yokoyama²,Shinichiro Mouri¹,Keiji Ueno²,Hajime Shirai²

Ritsumeikan University¹,Saitama University²

2D materials | nucleation & growth

Gabriela Borin Barin, Empa

Shengxi Huang, Rice University

Yuxuan Cosmi Lin, TSMC Technology Inc

Lain-Jong Li, The University of Hong Kong

Silver
Montana Instruments

Bronze
Oxford Instruments WITec
PicoQuant
Raith America, Inc.

Yuxuan Cosmi Lin

Xu Zhang

Mist CVD Modulated High-κ a-Al1-xTixOy Films for p-WS0.3Se1.7-Channel Metal Oxide Field Effect Transistors (MOSFETs)