Atomic Layer Deposition of WO_x-Doped In₂O₃ for High-Performance BEOL-Compatible Transistors

Nov 30, 2023
9:00am - 9:15am

Hynes, Level 3, Room 301

Fei Huang

Wilman Tsai

Chanyoung Yoo^1,2,Balreen Saini²,Jonathan Hartanto²,Fei Huang²,Cristian Arens²,John Baniecki¹,Wilman Tsai²,Baylor Triplett²,Paul McIntyre^1,2

SLAC National Accelerator Laboratory¹,Stanford University²

atomic layer deposition

Gina Adam, George Washington University

Sayani Majumdar, Tampere University

Radu Sporea, University of Surrey

Yiyang Li, University of Michigan

Bronze
APL Machine Learning | AIP Publishing

Gianluca Milano

Radu Sporea

Atomic Layer Deposition of WOx-Doped In2O3 for High-Performance BEOL-Compatible Transistors