Normally-Off Vertical Diamond MOSFETs with Drain Current Density over 200 mA/mm using Oxidized Si Terminated Diamond Channel Formed by Si Molecular Beam Deposition Approaches

When and Where

Dec 7, 2023
9:00am - 9:05am

EL14-virtual

Presenter(s)

Kento Narita

Kosuke Ota

Yu Fu

Chiyuki Wakabayashi

Atsushi Hiraiwa

Tatsuya Fujishima

Hiroshi Kawarada

Co-Author(s)

Kento Narita¹,Kosuke Ota^1,2,Yu Fu¹,Chiyuki Wakabayashi¹,Atsushi Hiraiwa¹,Tatsuya Fujishima²,Hiroshi Kawarada^1,2,3

Waseda University¹,Power Diamond Systems, Inc.²,The Kagami Memorial Research Institute for Materials Science and Technology³

Keywords

chemical vapor deposition (CVD) (deposition) | diamond

Symposium Organizers

Philippe Bergonzo, Seki Diamond Systems

Chia-Liang Cheng, National Dong Hwa University

David Eon, Institut Neel

Anke Krueger, Stuttgart University

Symposium Support

Platinum
Great Lakes Crystal Technologies

Gold
Element Six

Silver
Plasmability, LLC
Qnami AG
SEKI DIAMOND SYSTEMS

Bronze
Applied Diamond, Inc.
DIAMFAB
Fraunhofer USA, Inc.

Session Chairs

Philippe Bergonzo

Chia-Liang Cheng

Symposium Supporters

2023 MRS Fall Meeting