Atomic Layer Deposition of Aluminium Doped Zn_1-xMg_xO as Highly Transparent Conducting Films

May 13, 2022
3:00pm - 3:15pm

Hawai'i Convention Center, Level 3, 318B

Poorani Gnanasambandan¹,Noureddine Adjeroud¹,Renaud Leturcq¹

Luxembourg Institute of Science and Technology¹

Al | atomic layer deposition | electrical properties

Robert Kaplar, Sandia National Laboratories

Srabanti Chowdhury, Stanford University

Yoshinao Kumagai, Tokyo University of Agriculture and Technology

Julien Pernot, University of Grenoble Alpes

Jack Flicker

Robert Kaplar

Atomic Layer Deposition of Aluminium Doped Zn1-xMgxO as Highly Transparent Conducting Films