Excellent Surface Passivation of n⁺-doped Silicon by PO_x/Al₂O₃ Stacks with High Positive Fixed Charge Density

May 9, 2022
2:30pm - 2:45pm

Hawai'i Convention Center, Level 3, 325A

Bart Macco

Roel Theeuwes¹,Jimmy Melskens²,Lachlan Black³,Wolfhard Beyer⁴,Willem-Jan Berghuis¹,Bart Macco¹,Erwin Kessels¹

Eindhoven University of Technology¹,TNO Energy Transition²,The Australian National University³,Forschungszentrum Jülich GmbH⁴

Daniel Hiller, TU Bergakademie Freiberg

Kaining Ding, Forschungszentrum Jülich GmbH

Alison Lennon, UNSW Sydney

David Young, National Renewable Energy Laboratory

Bronze
Forschungszentrum Jülich GmbH
National Renewable Energy Laboratory

Cassidy Sainsbury

David Young

Excellent Surface Passivation of n+-doped Silicon by POx/Al2O3 Stacks with High Positive Fixed Charge Density