May 8 - 13, 2022
Honolulu, Hawaii
May 23 - 25, 2022 (Virtual)
2022 MRS Spring Meeting
EQ04.03.02
Sub-Micrometer Photothermal Pattering of Polymer Semiconductors Using Cleanroom Lithography Equipment
When and Where
May 10, 2022
8:30am - 8:45am
8:30am - 8:45am
Hawai'i Convention Center, Level 3, 315
Presenter(s)
Co-Author(s)
Adam Moule1,Tucker Murrey1,Meghna Jha1,Sarah Dolan1,Justin Mulvey1,Alice Fergerson1
University of California, Davis1
Keywords
polymer | selective area deposition
Symposium Organizers
Gerardo Hernandez-Sosa, Karlsruhe Institute of Technology
Do Hwan Kim, Hanyang University
Tse Nga Ng, University of California, San Diego
Yong-Young Noh, Pohang University of Science and Technology
Symposium Support
Bronze
Advanced Devices & Instrumentation, a Science Partner Journal | AAAS
The Polymer Society of Korea
Advanced Devices & Instrumentation, a Science Partner Journal | AAAS
The Polymer Society of Korea
Session Chairs
Do Hwan Kim