May 8 - 13, 2022
Honolulu, Hawaii
May 23 - 25, 2022 (Virtual)
2022 MRS Spring Meeting
MF01.03.05
Plasma-Based (spatial) ALD for High-Volume, Low-Temperature Applications
When and Where
May 9, 2022
3:30pm - 4:00pm
3:30pm - 4:00pm
Hawai'i Convention Center, Level 3, 319B
Presenter(s)
Co-Author(s)
Erwin Kessels1
Eindhoven Univ of Technology1
Keywords
atomic layer deposition | nanoscale | plasma deposition
Symposium Organizers
Fumiyoshi Tochikubo, Tokyo Metropolitan University
Jane Chang, University of California, Los Angeles
Masaharu Shiratani, Kyushu University
David Staack, Texas A&M University
Symposium Support
Bronze
The Japan Society of Applied Physics
The Japan Society of Applied Physics
Session Chairs
Jane Chang
Nathan Marchack