Engineering Defects and Interfaces of ALD TiO_x Protective Coatings for Highly Efficient III-V Photocathodes

May 12, 2022
10:30am - 10:45am

Hawai'i Convention Center, Level 3, 321B

Alex Henning

Ian Sharp

Oliver Bienek¹,Benedikt Fuchs¹,Matthias Kuhl¹,Alex Henning¹,Ian Sharp¹

Technische Universität München¹

atomic layer deposition

Vijay Parameshwaran, U.S. Army Research Laboratory

Esther Alarcon-Llado, AMOLF

Todd Deutsch, National Renewable Energy Laboratory

Shu Hu, Yale University

Bronze
National Renewable Energy Laboratory
Yale Energy Science Institute

Minjoo Larry Lee

Myles Steiner

Engineering Defects and Interfaces of ALD TiOx Protective Coatings for Highly Efficient III-V Photocathodes