May 8 - 13, 2022
Honolulu, Hawaii
May 23 - 25, 2022 (Virtual)
2022 MRS Spring Meeting
MF01.03.02
Transient Behaviors of Gaseous and Surface Reactions in a Cycle of Pasivation and Etch Steps Using Ar-Based C4F8 and SF6 Plasma
When and Where
May 9, 2022
2:00pm - 2:15pm
2:00pm - 2:15pm
Hawai'i Convention Center, Level 3, 319B
Presenter(s)
Co-Author(s)
Kenji Ishikawa1,Taito Yoshie1,Takayoshi Tsutsumi1,Hiroki Kondo1,Makoto Sekine1,Masaru Hori1
Nagoya University1
Keywords
reactive ion etching
Symposium Organizers
Fumiyoshi Tochikubo, Tokyo Metropolitan University
Jane Chang, University of California, Los Angeles
Masaharu Shiratani, Kyushu University
David Staack, Texas A&M University
Symposium Support
Bronze
The Japan Society of Applied Physics
The Japan Society of Applied Physics
Session Chairs
Jane Chang
Nathan Marchack