Ferroelectric Phase Formation in Hf_0.5Zr_0.5O₂ Using Dual-Step PLD Growth Strategy for MoS₂ Negative Capacitance Field-Effect Transistors

Nov 30, 2022
8:00pm - 10:00pm

Hynes, Level 1, Hall A

Uisik Jeong

Hae Won Cho

Pavan Pujar

Sunkook Kim

Uisik Jeong¹,Hae Won Cho¹,Pavan Pujar¹,Sunkook Kim¹

Sungkyunkwan University¹

grain size | x-ray diffraction (XRD)

Ying-Hao Chu, National Tsing Hua University

Catherine Dubourdieu, Helmholtz-Zentrum Berlin / Freie Universität Berlin

Olga Ovchinnikova, Oak Ridge National Laboratory

Bhagwati Prasad, Indian Institute of Science

Bronze
CRYOGENIC LIMITED

Ying-Hao Chu

Bhagwati Prasad

Ferroelectric Phase Formation in Hf0.5Zr0.5O2 Using Dual-Step PLD Growth Strategy for MoS2 Negative Capacitance Field-Effect Transistors