Improvements of Self-Aligned Multi Patterning Spacer Technology by PEALD Sn-Doped SiO₂

Nov 30, 2022
8:00pm - 10:00pm

Hynes, Level 1, Hall A

Suhyeon Park

Junyoung An

Heejun Yoon

Suhyeon Park¹,Junyoung An¹,Heejun Yoon¹,Hyeongtag Jeon¹

Hanyang University¹

atomic layer deposition | composite | multiscale

Ying-Hao Chu, National Tsing Hua University

Catherine Dubourdieu, Helmholtz-Zentrum Berlin / Freie Universität Berlin

Olga Ovchinnikova, Oak Ridge National Laboratory

Bhagwati Prasad, Indian Institute of Science

Bronze
CRYOGENIC LIMITED

Ying-Hao Chu

Bhagwati Prasad

Improvements of Self-Aligned Multi Patterning Spacer Technology by PEALD Sn-Doped SiO2