November 27 - December 2, 2022
Boston, Massachusetts
December 6 - 8, 2022 (Virtual)
2022 MRS Fall Meeting
SF03.01.02

Atomic Layer Control of MoS2 by RIE with Mixed (Ar+O2+CF4) Plasma and Its Etching Mechanism with Numerical Analysis

When and Where

Nov 29, 2022
10:15am - 10:30am
Sheraton, 3rd Floor, Hampton

Presenter(s)

Co-Author(s)

Changmin Kim1,Muyoung Kim2,Donghyun Cho2,In-Young Park2,Sungkwon Jo2,Daewoong Kim2,Woo Seok Kang2,Taesung Kim1,Hyeong-U Kim2

Sungkyunkwan University1,Korea Institute of Machinery and Materials2

Keywords

atomic layer etching | plasma-enhanced CVD (PECVD) (chemical reaction) | reactive ion etching

Symposium Organizers

Wei-Hung Chiang, National Taiwan University of Science and Technology
Carla Berrospe-Rodríguez, University of California, Riverside
Fiorenza Fanelli, National Research Council (CNR)
Tsuyohito Ito, The University of Tokyo

Session Chairs

Wei-Hung Chiang
Chi-Chin Wu

In this Session