ALD Growth of Wafer-Scale WS₂ Film and Device Applications with Non-Toxic and Less Corrosive Precursors

Apr 18, 2021
7:28pm - 7:31pm

NM07

Hanjie Yang

Yang Wang

Tao Chen

Rongxu Bai

Zecheng Wu

Zhongya Pang

Xingli Zou

Hao Zhu

Lin Chen

Qingqing Sun

Li Ji

Hanjie Yang¹,Yang Wang¹,Tao Chen¹,Rongxu Bai¹,Zecheng Wu¹,Zhongya Pang²,Xingli Zou²,Hao Zhu¹,Lin Chen¹,Qingqing Sun¹,Li Ji¹

Fudan University¹,Shanghai University²

2D materials | thin film

Thomas Kempa, Johns Hopkins University

Zakaria Al Balushi, University of California, Berkeley

Ying Fang, National Center for Nanoscience and Technology

Deep Jariwala, University of Pennsylvania

Bronze
MilliporeSigma

Ying Fang

Thomas Kempa

ALD Growth of Wafer-Scale WS2 Film and Device Applications with Non-Toxic and Less Corrosive Precursors