Correlation Between Plasma Etching Behavior of Silicon Carbide and Micropipe Defects

Nov 30, 2021
8:00pm - 10:00pm

Hynes, Level 1, Hall B

Je Hoon Oh

Jongbeom Kim

Je Jun Jeong

Kyu Hwan Oh

Je Hoon Oh¹,Jongbeom Kim¹,Je Jun Jeong¹,Kyu Hwan Oh¹

Seoul National University¹

chemical vapor deposition (CVD) (chemical reaction) | defects | physical vapor deposition (PVD)

Noa Lachman, Tel Aviv University

Graziella Malandrino, Univ di Catania

Kevin Musselman, University of Waterloo

Wyatt Tenhaeff, University of Rochester

Bronze
Waterloo Institute for Nanotechnology

Bo Li

Wyatt Tenhaeff