Polycrystalline MoS₂ Thin Films at 100 °C by Plasma-Enhanced Atomic Layer Deposition

Nov 30, 2021
11:30am - 11:45am

Hynes, Level 1, Room 103

Farzan Gity

Emma Coleman

Ray Duffy

Ageeth Bol

Miika Mattinen¹,Farzan Gity²,Emma Coleman²,Ray Duffy²,Erwin Kessels¹,Ageeth Bol¹

Eindhoven University of Technology¹,Tyndall National Institute²

2D materials | atomic layer deposition

Zakaria Al Balushi, University of California, Berkeley

Cinzia Casiraghi, University of Manchester

Joshua Robinson, The Pennsylvania State University

Hyeon Jin Shin, Samsung Advanced Institute of Technology

Silver
Penn State 2DCC-MIP

Zakaria Al Balushi

Deep Jariwala

Polycrystalline MoS2 Thin Films at 100 °C by Plasma-Enhanced Atomic Layer Deposition