High-Temperature Growth of Amorphous In₂O₃:Sn Films by Magnetron Sputtering Using Nitrogen

Dec 6, 2021
10:55pm - 11:00pm

EQ09-Virtual

Yuta Mido

Keigo Takeda

Masaru Hori

Naho Itagaki

Yuta Mido¹,Keigo Takeda²,Daisuke Yamashita¹,Takamasa Okumura¹,Kunihiro Kamataki¹,Kazunori Koga¹,Masaharu Shiratani¹,Masaru Hori³,Naho Itagaki¹

Kyushu University¹,Meijo University²,Nagoya University³

Hall effect | thin film

Davide Mariotti, Ulster University

Rebecca Anthony, Michigan State University

Wei-Hung Chiang, National Taiwan University of Science and Technology

Chi-Chin Wu, U.S. Army Research Laboratory

Naho Itagaki

Tsuyohito Ito

High-Temperature Growth of Amorphous In2O3:Sn Films by Magnetron Sputtering Using Nitrogen