EUV Photoresist Dissolution Using Microperfusion Stage for High-Speed AFM

Dec 6, 2021
1:45pm - 2:00pm

CH03-Virtual

Jiajun Chen

Luke Long

Paul Ashby

Jiajun Chen¹,Luke Long²,Andrew Neureuther²,Patrick Naulleau¹,Paul Ashby¹

Lawrence Berkeley National Laboratory¹,University of California, Berkeley²

in situ | lithography (removal) | scanning probe microscopy (SPM)

Philippe Leclere, University of Mons

Zoya Leonenko, University of Waterloo

Ken Nakajima, Tokyo Institute of Technology

Igor Sokolov, Tufts University

Gold
Bruker

Silver
Oxford Instruments, Asylum Research

Bronze
Nanosurf

Philippe Leclere

Ken Nakajima

Igor Sokolov