November 29 - December 2, 2021
Boston, Massachusetts
December 6 - 8, 2021 (Virtual)
2021 MRS Fall Meeting
SF01.02.04
Plasma-Enhanced Atomic Layer Deposition of Titanium Nitride—Impact of the N-Reactant on the Growth, Conformality and Quality of the Film
When and Where
Nov 30, 2021
2:15pm - 2:30pm
2:15pm - 2:30pm
Sheraton, 3rd Floor, Berkeley
Presenter(s)
Co-Author(s)
Badie Clemence1,Maissa Barr2,Julien Bachmann2,3,Thomas Defforge4,Gael Gautier4,Héloise Tissot1,Lionel Santinacci1
Aix-Marseille Université1,Friedrich-Alexander-Universität Erlangen-Nürnberg2,Saint-Petersburg State University3,Tours Université4
Keywords
atomic layer deposition | nitride
Symposium Organizers
Noa Lachman, Tel Aviv University
Graziella Malandrino, Univ di Catania
Kevin Musselman, University of Waterloo
Wyatt Tenhaeff, University of Rochester
Symposium Support
Bronze
Waterloo Institute for Nanotechnology
Waterloo Institute for Nanotechnology
Session Chairs
Bo Li
David Munoz-Rojas