April 22 - 26, 2019
Phoenix, Arizona
2019 MRS Spring Meeting
EP07.01.04

Polysiloxane Thin Films Deposited by iCVD—Application to Through-Silicon via Insulation

When and Where

Apr 23, 2019
11:45am - 12:00pm
PCC North, 200 Level, Room 221 B

Presenter(s)

Co-Author(s)

Vincent Jousseaume1,2,Kazuya Ichiki3,Chloe Guerin1,2,Melanie Lagrange1,2,Manon Van-Straaten1,2,Benjamin Assie1,2,Christophe Ratin1,2,Mathilde Gottardi1,2,Marc Veillerot1,2,Celine Ribiere1,2,Gilles Romero1,2,Pierre-Emile Philip1,2,Daniel Scevola1,2,Yorrick Exbrayat1,2,Antonio Roman1,2,Christophe Licitra1,2,Stephane Minoret1,2,Sophie Verrun1,2,Bruce Altemus4,Thierry Mourier1,2,Jacques Faguet4

Université Grenoble Alpes1,CEA, LETI2,Tokyo Electron Europe Limited3,Tokyo Electron US Holdings4

Keywords

chemical vapor deposition (CVD) (deposition) | polymer

Symposium Organizers

Vincent Jousseaume, CEA-LETI
Silvia Armini, IMEC
Eiichi Kondoh, University of Yamanashi
Frank Mont, GLOBALFOUNDRIES

Symposium Support

ASM International NV
CEA, LETI
Entegris, Inc
TEL

Session Chairs

Silvia Armini
Vincent Jousseaume

In this Session